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High hardness and low dielectric constant thin films with oriented urea oligomers by physical vapor deposition

  • Masahiro Morimoto*
  • , Tatsuya Fukutomi
  • , Yasuko Koshiba
  • , Kenji Ishida
  • *この論文の責任著者

研究成果: ジャーナルへの寄稿学術論文査読

5   !!Link opens in a new tab 被引用数 (Scopus)

抄録

Oligomers of undecylurea (OUA11) thin films with a high crystallinity, surface hardness, perpendicular orientation, and low dielectric constant were fabricated by physical vapor deposition. The thin films were composed of single OUA11, which has a relatively high molecular weight (Mw: 2500, Mn: 1200) and could be vapor-deposited without thermal decomposition. These films had a much higher crystallinity and a high surface hardness level of 9H in the pencil hardness test. The dielectric constant of the OUA11 films is estimated to be 2.1–2.3 in the frequency range of 1 Hz–0.1 MHz, which is lower than that of typical low dielectric constant (low-k) materials. These physical and electrical properties are caused by the unique structure with the molecular dipoles-oriented parallel to the electrodes on the substrate and the strong intermolecular hydrogen bonds. The unique structure could not be observed with spin-coating and is specific to the vapor-deposited films. We expect that the OUA11 films with a high hardness and a low dielectric constant can be used not only as protective coatings but also as electronic materials.

本文言語英語
ページ(範囲)2483-2492
ページ数10
ジャーナルJournal of Materials Science
54
3
DOI
出版ステータス出版済み - 2019/02/01

ASJC Scopus 主題領域

  • 材料科学一般
  • 材料力学
  • 機械工学

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