Surface morphology of YSZ thin films deposited from a precursor solution under the electrical fields

In this study, surface morphology control and patterning has been carried out during deposition of thin films from a precursor solution by applying electrochemical method and electrical filed at the same time. The precursor was an aqueous solution of zirconyl nitrate, Y(NO₃)₃ -6H₂O, and NH₃(aq). The thin film was deposited on the glass substrate of the minus electrode side. By applying the electrical field of 2.3-3.0 V, the Zr(Y)(OH)₄ thin film was effectively deposited on glass substrates at room temperature. The as-deposited film was amorphous, and a crystalline phase of YSZ can be obtained after annealing at 723 K for 6 h in air. In order to establish morphology control and patterning, another pulse bias was applied to the electrical field along the perpendicular direction from the film deposition direction. The pulse type, frequency, amplitude, duty ratio were changed and the effect to the surface morphology was investigated. At only in limited condition, the striped patterns of YSZ films due to the frequency of the applied pulsed electrical field were observed.