Fundamental Configuration and Principles of a Stereolithography System Utilizing Magnetic Levitation Technique

Kohei Nishi, Junki Yui, Takahisa Ohji^*, Kenji Amei

^*Corresponding author for this work

Research output: Contribution to conference › Paper › peer-review

Original language	English
Number of pages	2
State	Published - 2023/11/12
Event	21st International Symposium on Applied Electromagnetics and Mechanics - Hachioji, Japan Duration: 2023/11/12 → 2023/11/15

Conference	21st International Symposium on Applied Electromagnetics and Mechanics
Abbreviated title	ISEM2023
Country/Territory	Japan
Period	2023/11/12 → 2023/11/15

Cite this

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title = "Fundamental Configuration and Principles of a Stereolithography System Utilizing Magnetic Levitation Technique",

author = "Kohei Nishi and Junki Yui and Takahisa Ohji and Kenji Amei",

year = "2023",

month = nov,

day = "12",

language = "英語",

note = "21st International Symposium on Applied Electromagnetics and Mechanics ; Conference date: 12-11-2023 Through 15-11-2023",

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TY - CONF

T1 - Fundamental Configuration and Principles of a Stereolithography System Utilizing Magnetic Levitation Technique

AU - Nishi, Kohei

AU - Yui, Junki

AU - Ohji, Takahisa

AU - Amei, Kenji

PY - 2023/11/12

Y1 - 2023/11/12

M3 - 学会論文

T2 - 21st International Symposium on Applied Electromagnetics and Mechanics

Y2 - 12 November 2023 through 15 November 2023

ER -