Effect of deposition conditions on the structure and properties of CrAlN films prepared by pulsed DC reactive sputtering in FTS mode at high Al content

Sara Khamseh*, Masateru Nose, Tokimasa Kawabata, Atsushi Saiki, Kenji Matsuda, Kiyoshi Terayama, Susumu Ikeno

*Corresponding author for this work

Research output: Contribution to journal › Article › peer-review

16 Scopus citations

Fingerprint

Dive into the research topics of 'Effect of deposition conditions on the structure and properties of CrAlN films prepared by pulsed DC reactive sputtering in FTS mode at high Al content'. Together they form a unique fingerprint.

Keyphrases

Engineering

Material Science