Material Science
Film
100%
Thin Films
77%
Surface (Surface Science)
35%
Single Crystal
35%
Zirconia
32%
X-Ray Diffraction
31%
Chemical Vapor Deposition
23%
Crystal Structure
23%
Cerium Oxide
23%
Solution
22%
Phase Composition
13%
Lattice Constant
12%
Yttrium Oxide
11%
Optical Property
11%
Potassium
11%
Tantalate
11%
Cathode
10%
Oxide Compound
10%
Hydrothermal Synthesis
10%
Electrical Resistivity
10%
Oxidation Reaction
10%
Surface Morphology
9%
Ferroelectricity
8%
Density
8%
Magnesium Oxide
8%
Anode
7%
Tantalum
7%
Activation Energy
7%
Magnetron Sputtering
6%
Lithium Ion
6%
Scanning Electron Microscopy
6%
Gas Flow
6%
Residual Stress
5%
Film Thickness
5%
Electrodeposition
5%
Tetragonal Zirconia
5%
Luminescence
5%
Oxygen Vacancy
5%
Electronic Property
5%
Transition Metal Chalcogenides
5%
Magnetism
5%
Dielectric Property
5%
Magnetic Property
5%
Cathode Material
5%
Volume Fraction
5%
Crystal Lattice
5%
Thermogravimetric Analysis
5%
Keyphrases
Glass Substrate
24%
Metal-organic Chemical Vapor Deposition (MOCVD)
23%
Annealing
21%
Aqueous Solution
21%
YSZ Thin Film
20%
Epitaxially Grown
20%
Single Crystal
18%
Electrical Field
17%
Ferroelectric Domain Switching
17%
Si(111)
15%
Heteroepitaxial Structures
14%
Zirconia
13%
Epitaxial
13%
Room Temperature
13%
Electrochemically Reduced
12%
Pyrochlore Structure
11%
Pseudo Single Crystal
11%
Oxygen Deficiency
11%
Potassium Tantalate
11%
Optical Properties
11%
High Temperature
11%
Deposition Temperature
11%
Critical Stress
10%
Surface Morphology
10%
Lattice Parameter
10%
Reactive Sputtering
9%
Mg-PSZ
9%
Yttria-stabilized Zirconia
9%
X-ray
9%
Domain Switching
9%
Crystal Growth
9%
Precursor Solution
9%
Phase Transition
9%
Pyrochlore-type
8%
Iron Phosphate
8%
Low Vacuum
8%
Ablation
8%
Dielectric Properties
8%
K2Ta2O6
8%
Volume Fraction
8%
Aluminum Oxide
8%
Film Thickness
8%
C-axis Orientation
8%
Solid-state Reaction
8%
MgO Substrate
8%
Lithium Carbonate
7%
X Ray Diffraction
7%
Zirconium Dioxide
7%
SrBi2Ta2O9
7%
YSZ Coating
7%
Engineering
Thin Films
48%
Yttria-Stabilized Zirconia
24%
Glass Substrate
16%
Mols
16%
Deposited Film
16%
Aqueous Solution
15%
Lattice Constant
14%
Chemical Vapor Deposition
14%
Phase Composition
13%
Electric Field
12%
Reactive Sputtering
12%
Crystal Structure
11%
Surface Morphology
10%
Room Temperature
10%
Lattice Parameter
9%
Critical Stress
8%
Deposition Temperature
7%
Fusion Reactor
7%
Vapor Deposition
6%
Polycrystalline
6%
Battery Life
5%
Lithium-Ion Cell
5%
Ray Photoelectron Spectroscopy
5%
Solid Reaction
5%
Apparent Activation Energy
5%
Reciprocal Space
5%
Deposition Condition
5%
Dielectrics
5%
Precursor Solution
5%
Gas Flowrate
5%
Face-Centered Cubic
5%